27. Thermal Atomic Layer Etching of Zinc Sulfide Using Sequential Trimethylaluminum and Hydrogen Fluoride Exposures: Evidence for a Conversion Mechanism
Taewook Nam, Jonathan L. Partridge, and Steven M. George
Chemistry of Materials, 2023, 35, 6671-6681 [Link]
2021
26. Growth Mechanism and Electrical Properties of Tungsten Films deposited by Plasma-enhanced Atomic Layer Deposition with Chloride and Metal
Yujin Lee, Seunggi Seo, Taewook Nam, Hyunho Lee, Hwi Yoon, Sangkyu Sun, Il-Kwon Oh, Sanghun Lee, Jin Hyung Seo, Jang Hyeon Seok, and Hyungjun Kim
Applied Surface Science, Volume 568, 1 December 2021, 150939[Link]
25. Hydrogen Barrier based on Chemical Trappingusing Chemically–modulated Al2O3grown byAtomic Layer Deposition for InGaZnO ThinFilm Transistor
22. (Invited Paper) (Selected as a Featured Article) “Atomic Layer Deposition of a Uniform Thin Film on 2-dimensional Transition Metal Dichalcogenides”
Taewook Nam, Seunggi Seo, and Hyungjun Kim
Journal of Vacuum Science and Technology A, 38, 030803 (2020) [Link]
21. “Comparative Study on Atomic Layer Deposition of HfO2 via Substitution of Ligand Structure with Cyclopentadiene“