25. Hydrogen Barrier based on Chemical Trapping using Chemically–modulated Al2O3 grown by Atomic Layer Deposition for InGaZnO Thin Film Transistor
Yujin Leea,#, Taewook Nama,b,#, Seunggi Seoa, Hwi Yoona, Chong Hwon Leea,d, Hyukjoon Yooa, Hyun Jae Kima, Wonjun Choic, Seongil Imc, Joon Young Yangd, Dong Wook Choid, Choongkeun Yood, Ho-jin Kimd, and Hyungjun Kima,*
#These authors contributed equally. Selected as a Cover.
ACS Applied Materials & Interfaces, 2021, 13, 17, 20349-20360. [Link]