Papers

Citations

H-Index

I10-Index

*As of 2021. 5. 1

2021

26. PEALD W ….

…, Taewook Nam^a,b,…

Submitted.

25. Hydrogen Barrier based on Chemical Trapping using Chemically–modulated Al₂O₃ grown by Atomic Layer Deposition for InGaZnO Thin Film Transistor

Yujin Lee^a,#, Taewook Nam^a,b,#, Seunggi Seo^a, Hwi Yoon^a, Chong Hwon Lee^a,d, Hyukjoon Yoo^a, Hyun Jae Kim^a, Wonjun Choi^c, Seongil Im^c, Joon Young Yang^d, Dong Wook Choi^d, Choongkeun Yoo^d, Ho-jin Kim^d, and Hyungjun Kim^a,*

^#These authors contributed equally. Selected as Cover.

ACS Applied Materials & Interfaces, 2021, 13, 17, 20349-20360. [Link]

24. Two-Dimensional MoS₂ Charge Injection Memory Transistors Utilizing Hetero-stack SiO₂/HfO₂ Dielectrics and Oxide Interface Traps

Livia Janice Widiapradja,^1,# Taewook Nam,^2,3,#Heesun Bae,¹Yeonsu Jeong,¹ Hye-Jin Jin,¹
Yangjin Lee,¹ Kwanpyo Kim,¹ Sangyoon Lee,² Hyungjun Kim,^{*, 2} and Seongil Im^{*, 1}

^#These authors contributed equally.

Advanced Electronic Materials, 2021, 2100074 [Link]

2020

23. MoS₂ Doping by Atomic Layer Deposition of High-k Dielectrics using Alcohol as Process Oxidants

Whang Je Woo¹, Seunggi Seo¹, Taewook Nam², Youngjun Kim¹, Donghyun Kim¹, Jeong-Gyu Song¹, Jun Hyung Lim³, Hyung-Jun Kim³, and Hyungjun Kim¹

Applied Surface Science, 541 (2021) 148504 [Link]

22. (Invited Paper) (Selected as a Featured Article)
“Atomic Layer Deposition of a Uniform Thin Film on 2-dimensional Transition Metal Dichalcogenides”

Taewook Nam, Seunggi Seo, and Hyungjun Kim

Journal of Vacuum Science and Technology A, 38, 030803 (2020) [Link]

21. “Comparative Study on Atomic Layer Deposition of HfO₂ via Substitution of Ligand Structure with Cyclopentadiene“

Sungmin Park,^a# Bo-Eun Park,^a# Hwi Yoon,^a Sanghun Lee,^a Taewook Nam,^a Taehoon Cheon,^b SooHyun Kim,^b Hwansung Cheon,^c Sangkyun Im,^c Taegeun Seong^c and Hyungjun Kim^a*

Journal of Materials Chemistry C (2020), 8, 1344-1352 [Link]

20. (Invited Feature Paper)
“Atomic layer deposition for nonconventional nanomaterials and their applications“

Taewook Nam and Hyungjun Kim^*

Journal of Materials Research (2020), 35(7) 656-680 [Link]

2019

19. “Moisture Barrier Properties of Low-temperature ALD Al₂O₃ using Various Oxidants“

Taewook Nam^a, Haksoo Lee^b, Sung Min Cho^b, Bonggeun Shong^c, Han-Bo-Ram Leed*, and Hyungjun Kim^a*

Ceramics International (2019), 45, 19105–19112 [Link]

18. “Hydrogen Barrier Performance of Lanthanum Oxide Deposited by Reactive Magnetron Sputtering“

Yujin Lee^a, Chong Hwon Lee^a, Taewook Nam^a, Sanghun Lee^a, Il-Kwon Oh^a, Joon Young Yang^b, Dong Wook Choi^b, Choongkeun Yoo^b, Ho-jin Kim^b, Woo-Hee Kim^c,*, and Hyungjun Kim^a,*

Journal of Material Science (2019) 54: 11145 [Link]

17. “Low-temperature, High-growth-rate ALD of SiO₂ using Novel Aminodisilane Precursor”

Taewook Nam^a, Hyunho Lee^a, Taejin Choi^a, Seunggi Seo^a, Chang Mo Yoon^a, Yunjung Choi^b, Heonjong Jeong^b, Hima K. Lingam^c, Venkateswara R. Chitturi^c, Andrey Korolev^c, Jong-Hyun Ahn^a, and Hyungjun Kim^a*

Applied Surface Science, 485 (2019) 381-390. [Link]

2018

16. “Molecular Oxidation of Surface -CH₃ During Atomic Layer Deposition of Al₂O₃ with H₂O, H₂O₂, and O₃: A Theoretical Study“

Seunggi Seo^a, Taewook Nam^a, Han-Bo-Ram Lee^b, Hyungjun Kim^a, and Bonggeun Shong^c

Applied Surface Science, 457 (2018) 376-380 [Link]

15. “High-Performance Ink-Synthesized Cu-Gate Thin-Film Transistor with Diffusion Barrier Formation“

Whang Je Woo¹, Taewook Nam¹, Il‑Kwon Oh¹, Wanjoo Maeng², and Hyungjun Kim¹

Metals and Materials International, 24 (2018) 652–656 [Link]

14. “Cobalt Titanium Nitride Amorphous Metal Alloys by Atomic Layer Deposition“

Taewook Nam^a, Chang Wan Lee^a,b, Taehoon Cheon^c, Woo Jae Lee^d, Soo-Hyun Kim^e, Se-Hun Kwon^d, Hyungjun Kim^a*, and Han-Bo-Ram Lee^f*

Journal of Alloys and Compounds, 737 (2018) 684-692 [Link]

2017

13. “Surface-Localized Sealing of Porous Ultralow-k Dielectric Films with Ultrathin (<2 nm) Polymer Coating“

Seong Jun Yoon^†⊥, Kwanyong Pak^‡⊥, Taewook Nam^§, Alexander Yoon^∥, Hyungjun Kim^§, Sung Gap Im^*‡, and Byung Jin Cho^*†

ACS Nano, 2017, 11 (8), pp 7841–7847 [Link]

12. “A Composite Layer of Atomic-layer-deposited Al₂O₃ and Graphene for Flexible Moisture Barrier“

Taewook Nam^a, Yong Ju Park^a, Haksoo Lee^b, Il-Kwon Oh^a, Jong-Hyun Ahn^a, Sung Min Cho^b, Hyungjun Kim^a,*, and Han-Bo-Ram Lee^c,*
Carbon, 116 (2017) 553-561 [Link]

2016

11. “Effects of TaN Diffusion Barrier on Cu-Gate ZnO:N Thin-film Transistors“

Whang Je Woo, Taewook Nam, Hanearl Jung, Il-Kwon Oh, Jeong-Gyu Song, Han-Bo-Ram Lee,
Wanjoo Maeng, and Hyungjun Kim

IEEE ELECTRON DEVICE LETTERS, VOL. 37, NO. 5, MAY 2016 [Link]

~ 2015

10. “High‐performance Alternating Current Electroluminescent Layers Solution Blended with Mechanically and Electrically Robust Nonradiating Polymers“

Seong Soon Jo,¹ Sung Hwan Cho,¹ Hae Jin Kim,² Taewook Nam,³ Ihn Hwang,¹
Seok-Heon Jung,⁴ Richard Hahnkee Kim,¹ Dhinesh Babu Velusamy,¹ Ju Han Lee,¹
Taejoon Park,¹ Jin Kyun Lee,⁴ Dae-Eun Kim,² Hyungsuk Lee,² Hyungjun Kim,³ Cheolmin Park¹

JOURNAL OF POLYMER SCIENCE, PART B: POLYMER PHYSICS 2015, 53, 1629–1640 [Link]

9. “Growth Characteristics and Properties of Indium Oxide and Indium-doped Zinc Oxide by Atomic Layer Deposition“

Donghyun Kim ^a, Taewook Nam ^a, Jusang Park ^a, Julien Gatineau ^b, Hyungjun Kim ^a,⁎

Thin Solid Films 587 (2015) 83–87 [Link]

8. “Growth Characteristics and Properties of Ga-doped ZnO (GZO) Thin Films Grown by Thermal and Plasma-enhanced Atomic Layer Deposition“

Taewook Nam^a, Chang Wan Lee^a,b, Hyun Jae Kim^a, Hyungjun Kim^a,∗

Applied Surface Science 295 (2014) 260–265 [Link]

7. “Graphene as an Atomically Thin Barrier to Cu Diffusion into Si“

Juree Hong,^a Sanggeun Lee,^a Seulah Lee,^a Heetak Han,^a Chandreswar Mahata,^a Han-Wool Yeon,^b Bonwoong Koo,^c Seong-Il Kim,^c Taewook Nam,^d Kisik Byun,^e Byung-Wook Min,^e Young-Woon Kim,^c Hyungjun Kim,^d Young-Chang Joo^b and Taeyoon Lee^*a

Nanoscale, 2014, 6, 7503–7511 [Link]

6. “Direct Imprinting of MoS2 Flakes on a Patterned Gate for Nanosheet Transistors“

Kyunghee Choi,a Young Tack Lee,a Sung-Wook Min,a Hee Sung Lee,a Taewook Nam,b Hyungjun Kimb and Seongil Im*a

Journal of Materials Chemistry C, 2013, 1, 7803 [Link]

5. “Nanosheet Thickness-modulated MoS₂ Dielectric Property Evidenced by Field-effect Transistor Performance“

Sung-Wook Min,^a Hee Sung Lee,^a Hyoung Joon Choi,^a Min Kyu Park,^b Taewook Nam,^c Hyungjun Kim,^c Sunmin Ryu^b and Seongil Im^*a

Nanoscale 2013, 5, 548-551 [Link]

4. “MoS2 Nanosheet Phototransistors with Thickness-Modulated Optical Energy Gap“

Hee Sung Lee†, Sung-Wook Min†, Youn-Gyung Chang†, Min Kyu Park‡, Taewook Nam§, Hyungjun Kim§, Jae Hoon Kim†, Sunmin Ryu‡, and Seongil Im*†

Nano Letters, 2012, 12 (7), pp 3695–3700 [Link]

3. “Low-temperature Atomic Layer Deposition of TiO2, Al2O3, and ZnO Thin Films“

Taewook Nam, Jae-Min Kim, Min-Kyu Kim, Woo-Hee Kim, Hyungjun Kim

Journal of the Korean Physical Society, Vol. 59, No. 2, August 2011, pp. 452-457 [Link]

2. “The Effects of Ultraviolet Exposure on the Device Characteristics of Atomic Layer Deposited-ZnO:N Thin Film Transistors”

Jae-Min Kim,^a S. J. Lim,^b Taewook Nam,^a Doyoung Kim,^a and Hyungjun Kim^a,*,z

Journal of The Electrochemical Society, 158 (5) J150-J154 (2011) [Link]

1. “Atomic Layer Deposition ZnO:N Flexible Thin Film Transistors and the Effects of Bending on Device Properties“

Jae-Min Kim¹, Taewook Nam¹, S. J. Lim², Y. G. Seol³, N.-E. Lee³, Doyoung Kim¹, and Hyungjun Kim^{1, a)}

Applied Physics Letters 98, 142113 (2011) [Link]

Journal Paper